According to the Laws of Chance: Group Exhibition

May 31–August 16, 2024

Kathleen O. Ellis Gallery

Reception: Friday, July 26, 5-7pm

According to the Laws of Chance is a subtitle included in many works by the Dadaist painter Jean Arp that describes his systematic yet chance-driven method of creating his simple and playful paintings. Arp would let torn pieces of paper fall to the floor to determine his painting or collage compositions. Although the outcomes are different, Arp’s ethos can be found in the work of the photographers selected for this group exhibition.

The artists in this exhibition—Cheryl Miller, Claire A. Warden, Jaclyn Wright, Josh Thorson, Kyle Tata, Louis Chavez, and Will Stith, and Light Work’s collection artists, Cecil McDonald, Jr., James Welling, Peter Finnemore, and Rita Hammond—are using and defining chance as a core element of their largely divergent practices.

Chance is a core tenet of photography. The image-makers in this exhibition embrace the unpredictable and find ways to amplify chance for conceptual and creative purposes. These artists interpret chance via darkroom and analog experimentation, conceptually driven exploration, daily image-making, and studio-based arranging. The results of these methods are surprising expressions of each artist’s voice. Together they showcase the wide-ranging use of chance and highlight it as a vital tool in contemporary photographic practice.

Special thanks to Daylight Blue Media

daylightblue.com

Light Work

lightwork.org

Cover Image by Jaclyn Wright

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